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Semiempirical correlation between the optical band gap of oxides and hydroxides and the electronegativity of their constituents

机译:氧化物和氢氧化物光带间隙与其成分的电负性的半血流相关性

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On the basis of new experimental results a previous proposed correlation between the optical band gap of oxides and the difference of electronegativity of their constituents is extended to mixed crystalline and amorphous TiO{sub}2-Fe{sub}2O{sub}3 (d,d-metal oxides) as well as to amorphous passive films grown on Al-Ta, Al-Ti, Al-Nb and Al-W alloys (sp,d-metal oxides). Moreover in analogy with previous results on anhydrous oxides, a correlation is proposed between the optical band gap of hydroxides and the electronegativities of their constituents after substituting the electronegativity of hydroxilic group to that of the oxygen. Like in the case of anhydrous oxides, two different interpolation lines have been found for sp-metal and d-metal hydroxides, respectively.
机译:在新的实验结果的基础上,氧化物光带间隙与其成分的电负性差之间的先前提出的相关性延伸到混合结晶和无定形TiO {} 2-Fe {} 2o {sub} 3(d ,D-金属氧化物)以及在Al-Ta,Al-Ti,Al Nb和Al-W合金(SP,D-金属氧化物)上生长的非晶无源膜。此外,与先前的无水氧化物的结果相比,在将羟基的电负性取代为氧气之后,提出在氢氧化物的光带间隙和其成分的电气期之间的相关性。类似于无水氧化物的情况下,已分别针对SP-金属和D-金属氢氧化物发现两条不同的内插线。

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