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DC and AC conductivity of PbSe/Si structures grown by pulsed laser ablation methods

机译:通过脉冲激光烧蚀方法生长的PBSE / SI结构的DC和AC电导率

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摘要

In this paper we report the result of investigation of the electrical transport in PLD grown n-PbSe/n-Si heterojunction by DC and AC current measurement techniques. This characterization method is a well-suited and simple technique to study the interface between two semiconductors. The Si substrates are highly doped (ρ = 0.45 Ωcm), and consequently most of the heterojunction depletion layer falls in the PbSe epilayer. Fabrication of PbSe thin films on Si substrates by the pulsed laser deposition(PLD) method has been demonstrated. The films were characterized by X-ray diffraction analysis.
机译:在本文中,我们通过DC和AC电流测量技术报告了PLD中的PLD中电气传输的研究结果。该表征方法是一种非常适合和简单的技术,用于研究两个半导体之间的界面。 Si基板高度掺杂(ρ=0.45Ωcm),因此大多数异质结耗尽层落入PBSE epilayer中。已经证明了通过脉冲激光沉积(PLD)方法在Si基板上制造PBSE薄膜。 X射线衍射分析表征薄膜。

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