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ALD-Deposited Nanometer Scale Metal Oxide Films as Adhesion Promoters for Sputtered Metal and Ceramic Coatings on PMMA

机译:ALD沉积的纳米金属氧化膜作为PMMA溅射金属和陶瓷涂料的粘合促进剂

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Magnetron sputtered metal and ceramic films have poor adhesion to certain polymer structures especially polymethylmethacrylate (PMMA) because of ion bombardment and short wavelength vacuum ultraviolet (VUV) radiation from the plasma. The PMMA surface suffers scission of the molecule's side chain by degradation of the ester group, consequently weakening the mechanical properties of the polymer. Nanometer-scale metal oxide Al_2O_3 and TiO_2 films deposited by atomic layer deposition (ALD) were deposited on PMMA plates prior to magnetron sputtered Ti and TiC films. They proved to have a multifunctional role in enhancing the adhesion of the sputtered layer. The adhesion significantly improved with increasing ALD film thickness up to ~40 nm thickness at which point the adhesion strength reached the cohesive strength of the substrate material itself. Using infra-red spectroscopy (ATR-FTIR) to monitor changes in the bonding in the surface layers, it is shown that the ALD layers act both as a shield against ion bombardment and also against the effects of VUV radiation from the plasma and so prevents the structural changes in the PMMA which otherwise cause degradation of adhesion.
机译:磁控溅射金属和陶瓷膜对某些聚合物结构的粘附性差,特别是聚甲基丙烯酸甲酯(PMMA),因为离子轰击和来自等离子体的短波长的真空紫外(VUV)辐射。 PMMA表面通过酯基的降解损失分子侧链的分泌,因此削弱了聚合物的机械性能。在磁控溅射的Ti和TiC膜之前,在PMMA板上沉积在PMMA板上沉积纳米级金属氧化物Al_2O_3和TiO_2膜。他们证明在增强溅射层的粘合方面具有多功能作用。粘合力显着改善,随着ALD薄膜厚度增加至多〜40nm厚度,粘合强度达到基材本身的粘性强度。使用红外光谱(ATR-FTIR)来监测表面层中键合的变化,表明ALD层作为防止离子轰击的屏蔽,也可以防止VUV辐射从等离子体的影响,因此防止PMMA的结构变化,否则粘附降低。

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