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Multifunctional Optical Coatings on Polymers Deposited by Pulse Magnetron Sputtering and Magnetron Enhanced PECVD

机译:脉冲磁控溅射沉积的聚合物上的多功能光学涂层,磁控镀膜增强PECVD

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摘要

Reactive pulse magnetron sputtering processes are of increasing interest for the deposition of high-precision optical coatings of high density, low roughness and shift-free environmental stability. SiO_2, Si_3N_4 and silicon oxynitride are attractive coating materials for interference filters produced by sputtering of a silicon target in a precisely controlled reactive gas mixture of oxygen and nitrogen. Polymer substrates are increasingly relevant for the application of optical coatings due to their mechanical and economical advantages. The opposing properties of hard and brittle metal oxide layers produced by sputtering on one hand and of the soft and elastic polymer substrates on the other hand may lead to adhesion failure and crack formation of the coatings. Magnetron PECVD (magPECVD) using HMDSO as precursor allows to deposit carbon containing films with polymer-like properties. Results show the suitability of these coatings as hard coatings or matching layers. Multifunctional layers on polymer substrates with antireflective and scratch resistant properties were deposited using a combined magPECVD and sputter deposition process.
机译:无功脉冲磁控溅射工艺对高密度,低粗糙度和无移动环境稳定性的高精度光学涂层的沉积较高。 SiO_2,Si_3N_4和氧氮化硅是用于通过在氧和氮的精确控制的反应气体混合物中溅射硅靶产生的干涉过滤器的吸引材料。由于其机械和经济的优点,聚合物基材越来越相关地施加光学涂层。通过溅射在一只手和柔软和弹性聚合物基板上产生的硬质金属氧化物层的相反特性,另一方面可能导致涂层的粘附破坏和裂缝形成。使用HMDSO作为前体的磁控膜PECVD(MagPecVD)允许用聚合物样性能沉积含碳膜。结果显示这些涂层作为硬涂层或匹配层的适用性。使用组合的MagpecVd和溅射沉积工艺沉积具有抗反射和耐刮擦性能的聚合物底物上的多官能层。

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