Polarization-insensitive etching in glass enabled by picosecond laser induced randomly oriented nanocracks - (PPT)

摘要

Polarization-insensitive space-selective etching of fused silica merely by chirping the Fourier-transform-limited fs pulses to picosecond (ps) pulses based on a commercial ultrashort laser system has been achieved. An interesting transition occurs from polarization-dependent etching regime to polarization-insensitive etching regime with the extension of the pulse duration from hundreds of femtoseconds to 10 picoseconds was observed. A high selectivity in the etching rate that is insensitive to the laser polarization has been obtained. The observed characteristic is useful for 3D glass subtractive printing and fabrication various kinds of glass microfluidic structures with complex 3D geometries.