首页> 外文会议>Annual International Conference on Micro Electro Mechanical Systems >MECHANICAL CHARACTERIZATION OF SILICON NITRIDE THIN-FILMS USING MICROTENSILE SPECIMENS WITH INTEGRATED 2D DIFFRACTION GRATINGS
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MECHANICAL CHARACTERIZATION OF SILICON NITRIDE THIN-FILMS USING MICROTENSILE SPECIMENS WITH INTEGRATED 2D DIFFRACTION GRATINGS

机译:具有集成2D衍射光栅的微调试样的氮化硅薄膜的机械表征

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This paper reports on the mechanical characterization of microtensile specimens made of silicon nitride (SiN{sub}x) thin-films with integrated 2D reflective gratings. By applying an axial force, the structures respond mechanically with an elongation and contraction in the longitudinal and transversal directions, respectively. The corresponding variations of both periods of the grating are monitored in real time by measuring the diffraction pattern resulting from the illumination of the grating with monochromatic light. The strain components are thus evaluated locally in the structure. By integrating such an optical technique with an efficient test structure previously developed, the extraction of materials' Young's modulus E, Poisson's ratio v, residual strain ε{sub}(res) and stress σ{sub}(res) and fracture strength σ{sub}0 is in principle made possible from the measurement of a single test structure. Here we demonstrate the extraction of E, ε{sub}(res), σ{sub}(res) and σ{sub}0 of the nitride films.
机译:本文报告了具有集成2D反射光栅的氮化硅(SiN {Sub} x)薄膜的微调制标本的机械表征。通过施加轴向力,结构分别在纵向和横向方向上机械地响应伸长和收缩。通过测量由单色光的光栅照明产生的衍射图案,实时监测光栅两段的相应变化。因此,应变成分在结构中局部评估。通过这样的光学技术与先前开发出一种高效测试结构,材料杨氏模量E,泊松比v,残余应变ε{子}的提取(RES)和应力σ{子}(RES)和断裂强度σ{积分原则上是可以从单个测试结构的测量来实现的。在这里,我们证明了氮化物膜的e,ε{sub}(res),σ{sub}(res)和σ{sub} 0的提取。

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