Thin film imaging technology on glass and plastic

摘要

Hydrogenated amorphous silicon (a-Si:H) technology offers a viable technological alternative for improved imaging of optical signals and high energy radiation. This paper reviews X-ray imaging technology in terms of detector operating principles, including optoelectronic characteristics, and fabrication process issues related to pixel (Schottky diode detector plus thin film transistor) integration. Recent results which describe the extension of the current fabrication processes to low (/spl sim/120/spl deg/C) temperature are also presented. The low temperature processing enables fabrication of thin electronics on flexible (polymer) substrates.