首页> 外文会议>International symposium on low and high dielectric constant materials >Structure-property relationships for nano-porous poly(methyl-silsesquioxane) films with low-dielectric constants prepared via organic/inorganic polymer hybrids
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Structure-property relationships for nano-porous poly(methyl-silsesquioxane) films with low-dielectric constants prepared via organic/inorganic polymer hybrids

机译:通过有机/无机聚合物杂交种制备的低介电常数纳米多孔聚(甲基 - 倍半硅氧烷)膜的结构 - 性质关系

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We present here results on a technique of incorporating air-voids into poly(methyl-silsesquioxane) (PMSSQ) for obtaining porous material with lower dielectric constant. By thermal decomposition of star-shaped hydroxy-terminated poly(carpolactone) (PCL) from a PCL/PMSSQ polymer hybrids, nanometer-scaled pores are introduced in PMSSQ whose dielectric constants show a continuous decrease with higher PCL compositions. Data from DMA, FTIR, TEM and TGA experiments for investigating the poregenerating process are reported.
机译:我们在此导致将空隙掺入聚(甲基 - 倍半硅氧烷)(PMSSQ)中的技术,以获得具有较低介电常数的多孔材料。通过从PCL / PMSSQ聚合物杂交化合物的星形羟基封端的聚(PCL)的热分解,在PMSSQ中引入纳米尺度的孔,其介电常数显示出与更高的PCL组合物的连续降低。报道了DMA,FTIR,TEM和TGA实验的数据进行研究,用于研究造成过程。

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