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3D Simulations of Ultra-Small MOSFETs: The Role of the Short Range Coulomb Interactions and Discrete Impurities on Device Terminal Characteristics*

机译:超小MOSFET的3D模拟:短程库仑相互作用和离散杂质对装置终端特征的作用*

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We have developed a three-dimensional particle based simulator with a coupled molecular dynamics routine that avoids the "double-counting" of the long-range portion of the Coulomb force. As opposed to drift-diffusion based simulators, the Monte Carlo simulator can accurately model high field transport in semiconductor devices, while enabling the real-space treatment of the interactions, including multi-ion and particle contributions, through the coupled molecular dynamics scheme. The inclusion of the electron-electron and electron-ion interactions was shown to play an important role in device simulations. The drain current for MOSFET devices was significantly decreased when the Coulomb forces were added. Using this simulator, random dopant ions in the channel have shown to create fluctuations in the drain current of deep sub-micron MOSFETS as well as fluctuations in the device threshold voltage.
机译:我们开发了一种具有耦合分子动力学例程的三维粒子模拟器,避免了库仑力的远程部分的“双计数”。与基于漂移扩散的模拟器相反,蒙特卡罗模拟器可以精确地模拟半导体器件中的高场传输,同时通过耦合分子动力学方案实现相互作用的实际空间处理,包括多离子和颗粒贡献。显示电子和电子离子相互作用显示在器件模拟中起重要作用。当加入库仑力时,MOSFET器件的漏极电流显着降低。使用该模拟器,通道中的随机掺杂剂离子已经显示出在深亚微米MOSFET的漏极电流中产生波动以及器件阈值电压的波动。

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