首页> 外文会议>Innovative Processing and Synthesis of Ceramics, Glasses, and Composites Symposium >High-pressure Self-propagating High-temperature Synthesis (SHS) of Cd-In-Ga-O powder for novel substrate used for gallium nitride based thin film growth
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High-pressure Self-propagating High-temperature Synthesis (SHS) of Cd-In-Ga-O powder for novel substrate used for gallium nitride based thin film growth

机译:用于氮化镓基薄膜生长的新型基材的CD-in-Ga-O粉末的高压自蔓延高温合成(SHS)

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The Self-propagating High-temperature Synthesis (SHS) method was used for producing CdIn_(1.673)Ga_(0.327)O_4 complex oxide,a potential substrate for growing GaN thin film. The SHS process was conducted using two initial mixtures, Cd-In_2O_3-Ga_2O_3, and Cd-In-Ga_2O_3 reaching combustion temperatures of 837 °C and 1,400 °C, respectively. The combination of these mixtures enabled us to carry out the synthesis below the sublimation temperature of the desired product (≈1,100 °C) and to increase its yield.Post-treatment increased the homogeneity of the product. The product after sintering had a lattice constant of 9.12 A. A high-pressure SHS process was developed to produce a product of a lattice constant of 9.04 A in less than a minute.
机译:自展开的高温合成(SHS)方法用于生产CDIN_(1.673)GA_(0.327)O_4复合氧化物,一种用于生长GaN薄膜的潜在基质。使用两个初始混合物,CD-IN_2O_3-GA_2O_3和CD-IN_2O_3分别达到837℃和1,400℃的CD-IN_2O_3进行SHS工艺。这些混合物的组合使我们能够在低于所需产物(≈1,100℃)的升华温度下进行合成,并增加其产率.Post治疗增加了产物的均匀性。烧结后的产物具有9.12 A的晶格常数。开发了高压SHS工艺以在不到一分钟的情况下生产9.04A的晶格常数的产物。

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