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Evaluation of an Innovative Hydraulic Barrier System for DNAPL Containment

机译:对DNAPL遏制创新液压屏障系统的评价

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Historic releases of trichloroethylene (TCE) from spills and discharges resulted in the contamination of the surficial aquifer system at the Precision Fabricating & Cleaning Company (PFC) site in Cocoa, Florida. TCE was used at the site during the period from 1964 to 1977 (Apollo program) for the precision cleaning of aerospace ground support equipment. The constituents of concern identified at the site are the chlorinated ethenes: TCE, cis-l,2-dichloroethene (cis-l,2-DCE), trans-1,2-dichloroethene (trans- 1,2-DCE), and vinyl chloride (VC). Detailed investigations completed within the study area revealed the presence of dense non aqueous phase liquid (DNAPL) source areas located on the PFC property and an associated dissolved plume extending approximately 1,200 feet downgradient from the site. Extensive groundwater transect profiling (using depth-discrete sampling) and monitoring of the dissolved plume demonstrated increasing ratios of degradation products with distance from the DNAPL source areas. To address groundwater impacts, a field-scale Remedial Measure Plan (RMP) was approved by the regulatory agencies. The primary objective of the RMP is to prevent or minimize further vertical or horizontal migration of chlorinated solvents from the site.
机译:从溢出和排放的历史悠久的三氯乙烯(TCE)导致精密制造和清洁公司(PFC)网站的表格含水层系统的污染,佛罗里达州。在1964年至1977年(Apollo计划)期间在该网站上使用了TCE,用于航空航天地面支撑设备的精确清洁。在该网站上鉴定的关注的成分是氯化替代:TCE,CIS-L,2-二氯乙烯(CIS-L,2-DCE),反式1,2-二氯乙烯(转载1,2-DCE),以及氯乙烯(Vc)。在研究区域内完成的详细调查揭示了位于PFC性质上的致密非水相液(DNAPL)源区的存在,并且相关的溶解羽流从现场延伸约1,200英尺的降级。广泛的地下水横断性分析(使用深度离散取样)和溶解羽流的监测证明了具有与DNAPL源区域的距离的降解产物的增加率。为了应对地下水影响,监管机构批准了现场规模的补救措施计划(RMP)。 RMP的主要目的是防止或最小化从现场的氯化溶剂的进一步垂直或水平迁移。

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