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BEHAVIOR OF Cu-In-Te ELECTRODEPOSITION FROM ACID SOLUTION

机译:Cu-in-TE电沉积来自酸溶液的行为

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Ternary compound-semiconductor; CuInTe_2, film was deposited cathodically under potentiostatic conditions on titanium substrate from aqueous solution containing CuCl_2, InCl_3, TeO_2 and HCl in this study. The deposition parameters such as electrolytic solution composition, potential and temperature were optimized for electrodeposition of CuInTe_2. Structural characterization of the deposited film was also carried out using XRD and SEM. Electrodeposited films were prepared and analyzed for their chemical composition using ICP. The ICP analyses showed that the stoichiometry of the films could be controlled by (1) the deposition potential and/or by (2) the electrolytic bath composition.
机译:三元化合物半导体; Cuinte_2,在该研究中,在含有CuCl_2的水溶液上的钛基底上的电位溶液沉积阴性沉积薄膜。沉积参数,例如电解溶液组合物,电位和温度,针对Cuinte_2的电沉积进行了优化。还使用XRD和SEM进行沉积膜的结构表征。使用ICP制备和分析电沉积的薄膜并分析其化学成分。 ICP分析表明,膜的化学计量可以通过(1)沉积电位和/或通过(2)电解浴组合物来控制。

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