Optical investigations of Cr and CrN layers obtained by magnetron sputtering in ion-beam-assisted deposition process (IBAD)

摘要

In the ion beam deposition process the source of material was Cr target subjected to magnetron sputtering. Cr and CrN layers deposition processes were carried out in the presence of Ar and Ar $PLU N$-2$/ ions atmosphere. The optical investigations of Cr and CrN layers obtained by IBAD processes were made to estimate the efficiency of such modifying factor as ion beam bombardment. The optical constants n and k were determined by ellipsometry for Cr and CrN layers deposited onto grounded or negatively biased (bias voltages from 0 to 500 V) BK7 glass substrates.