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The Effect of Zn/Sn Ratio on the Electrical Performance of Amorphous ZrZnSnO (ZZTO) Thin Film Transistors by RF Sputtering

机译:Zn / Sn比对射频溅射的无定形Zrznsno(ZZTO)薄膜晶体管电性能的影响

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Amorphous zirconium-zinc-tin-oxide (a-ZZTO) thin films and thin film transistors (TFTs) are investigated. The transmittance of the a-ZZTO is over 80% in the visible light wavelength region. The band gap, extracted from Tauc plot, is around 3.8 eV. The as-fabricated Zr_(0.03)Zn_(0.32)Sn_(0.65)O TFT exhibits a threshold voltage of 2.8 V, field-effect mobility of 10.25 cm~2/V-s, a sub-threshold swing of 800 mV/dec and an on/off ratio of 10~5. As the Zn/Sn ratio increases, the threshold voltage increases and the field-effect mobility decreases.
机译:研究了非晶锆 - 氧化锌(A-ZZTO)薄膜和薄膜晶体管(TFT)。在可见光波长区域中,A-ZZTO的透射率超过80%。从Tauc图中提取的带隙是大约3.8eV。 AS制造的Zr_(0.03)Zn_(0.32)Sn_(0.65)O TFT表现出2.8 V的阈值电压,现场效应迁移率为10.25cm〜2 / Vs,亚阈值摆动为800 MV / DEC和AN ON / OFF比率为10〜5。随着Zn / Sn比的增加,阈值电压增加并且场效应迁移率降低。

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