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The Preparation and Properties of TiN/carbon Coatings by Ion Beam Assistant Magnetron Spurting Deposition

机译:离子束辅助磁控扫描沉积锡/碳涂层的制备及性能

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TiN/carbon multilayer coatings were deposited on M2 and GCr15 wafers by ion beam assistant magnetron spurting deposition (IBMSD). The hardness, elastic modulus, fracture toughness, adhesion strength and tribological properties were investigated. The results show that TiN coating by means of static recoil N~+ doped interface preparation and Ar~+ beam assistant magnetron spurting has 2 times adhesion strength, 5 times hardness of none-beam-assistant TiN coating. The wear rate of GCr15 wafer with TiN(2h)/Carbon(4h) multilayer coating is 0.36×10~(-15)m~3/Nm,1/5 of that of GC15 wafer without coating. The wear rate of M2 wafer with TiN(2h)/Carbon(4h) multilayer coating is 2.8×10~(-15)m~3/Nm, 1/8 of that of M2 wafer without coating. The friction coefficient of GCrl5 wafter with TiN(2h)/Carbon(4h) multilayer coating is lower than 0.15, and that is 0.04 for M2 wafer. These results indicate that thickness ratio of TiN to carbon is important for the tribological properties of TiN/carbon coating, thick lubricant xarbon/thin load-support TiN multilayer coating has better comprehensive tribological properties.
机译:通过离子束辅助磁控管喷射沉积(IBMSD)在M2和GCR15晶片上沉积锡/碳多层涂层。研究了硬度,弹性模量,断裂韧性,粘附强度和摩擦学特性。结果表明,锡涂层通过静电反冲N〜+掺杂界面制备和Ar〜+梁辅助磁控溅射具有2倍的粘附强度,无光束辅助锡涂层的5倍硬度。 GCR15晶片的磨损率与锡(2H)/碳(4H)多层涂层为0.36×10〜(-15)m〜3 / nm,GC15晶片的1/5,无涂层。使用锡(2H)/碳(4H)多层涂层的M2晶片的磨损率为2.8×10〜(-15)m〜3 / nm,其中M2晶片的1/8而无涂层。用锡(2H)/碳(4H)多层涂层的GCR15旋转摩擦系数低于0.15,为M2晶片为0.04。这些结果表明,锡与碳的厚度比对于锡/碳涂层的摩擦学性能是重要的,厚润滑剂Xarbon /薄荷载体锡多层涂层具有更好的综合性摩擦性质。

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