Patterned xy grids and a multistep height sample for calibration of profilometers and scanning probe microscopes

摘要

A test structure having four patterned xy grids with pitches of 1, 2, 5 and 30 μm, and a multistep height sample have been fabricated on silicon substrates using direct-write electron beam lithography for the grids and a highly-stable polymer combined with thick film preparation for the step sample. The feasibility of the fabrication processes has been tested with a first set of samples measured using a diffractometer and a stylus profilometer. Results of preliminary measurements are discussed together with further improvements of the adopted processes.