Nonlinear Model Reduction for RTCVD

摘要

In this paper, we exmine alternative methods for reducing the dimensionaltiy of nonlinear dynamical system models arising in control of rapidthermal chemical vapor deposition for semiconductor manufac-turing. We foucs on model reduction for the ordinary differential equation model describing heat transfer to from ,and within a semiconductor wafer in the RTCVD chamber. Tow model reduction approaches are studied and compared: the proper orthogonal decomposition andthe metd of balancing. THis leads to a discussion of ocmputational issues in the practical implementation of balancing for nonlinear systems.