The films of amorphous carbon with different amount of incorporated nitrogen are deposited by helical resonator plasma enhanced chemical vapor deposition using CH/sub 4/, Ar, and N/sub 2/ gas mixture. As the increase of nitrogen in the films, the optical band gap and sp/sup 3/ bond fraction decreased. The higher field emission current and the lower turn-on voltage are obtained from the sample of the higher nitrogen content. The increase of the conducting part of the films and the role of nitrogen as an electrical donor are responsible for the enhanced field emission.
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机译：通过螺旋谐振器等离子体增强的化学气相沉积，使用CH / SUB 4 /，AR和N / SUB 2 /气体混合物，沉积不同量的氮气的无定形碳膜。随着薄膜中的氮的增加，光学带隙和SP / SUP 3 /键合级分降低。从较高的氮含量的样品获得较高的场发射电流和下开启电压。导电部分的膜的增加和作为电动供体的作用是增强的场发射负责。
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