A NEW IC WAFERS WASHING METHOD: QC(QUICK CHANGE) WASHING

摘要

A new IC wafer washing has been developed. It is called as QC (Quick Change) washing which is possible to save DI water consumption by using the QC rinse bath. The concentration of the chemicals remaining on the wafer in a rinse process is depends on the concentration of the residual chemicals in the solution of the rinse bath. In QC washing, the concentration of the residual chemicals in the solution of the rinse bath is quickly diluted by using the QC rinse bath which is possible to change quickly the solution in the rinse bath to the supplied DI water. In this paper, the principle of the QC rinse bath, the experimental results for the change rate in QC rinse bath and OF (over flow) rinse bath obtained by a color water method and an application to new IC wafer washing system have been reported.