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Stress dependence of magnetic domains in FeCoSiB amorphous films

机译:磁性域在Fecosib非晶膜中的应力依赖性

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The work reports the effect of a tensile stress on the magnetic domain of FeCoSiB amorphous films. The domain structures of the unstressed and stressed FeCoSiB amorphous films with different tensile strains have been studied by magnetic force microscopy (MFM). With the increase of the tensile stress in the samples, it has been observed that the domain structures transform from irregular domains into parallel strip domains, and magnetic contrasts decrease. The MFM image disappears when the tensile stress is strong enough. A model has been presented to explain the evolution of the domain structures under the tensile stress. The effects of the stress on the domain of the films have been discussed.
机译:该工作报告了拉伸应力对FeCosib非晶膜的磁域的影响。已经通过磁力显微镜(MFM)研究了具有不同拉伸菌株的未经用的和应力的Fecosib非晶膜的畴结构。随着样品中的拉伸应力的增加,已经观察到从不规则结构域转化为平行带畴,并且磁对比减小的畴结构降低。当拉伸应力足够强时,MFM图像消失。已经提出了一种模型来解释在拉伸应力下的畴结构的演变。已经讨论了应力对薄膜结构域的影响。

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