Electrodeposition of Tantalum Boride Coatings from Oxofluoride Melts

摘要

Electrochemical behaviour of tantalum and boron in fluoride and oxofluoride melts was studied by cyclic voltammetry. It was shown that in oxygen - free melts boron reduces with depolarization on the tantalum surface formed at the less cathodic potential. Alternatively, in oxofluoride melts, both components reduce simultaneously perhaps from heteronuclear complexes. X-ray amorphous microlayered coatings, consisting mostly of Ta_3B_4, were obtained from FLINAK-K_2TaF_7-KBF_4-Na_2O melts.