Characterization of particle motion for polishing and texturing under A.C field by using particle dispersion type ER fluid

摘要

The authors have already proposed a new method of polishing using particle dispersion type ER fluid. And also have applied this method for polishing micro hole in a ceramic disk. In this paper, we characterize the particle dispersion type ER fluid and particle motion suitable for polishing and texturing. We selected the type of abrasive material to be used in ER fluid based on theoretical calculation of the force exerted by an individual particle under alternative electric field. And also, we haveexperimentally obtained the force generated by ER fluid dispersing diamond particles of different size range, concentrations and dispersing media with different viscosities. Furthermore, we have observed the particle response using a high speedvideo-camera.