LIQUID MOCVD PRECURSORS AND THEIR APPLICATION TO FIBER INTERFACE COATINGS

摘要

Metalorganic Chemical Vapor Deposition (MOCVD) is a common route to thin-film and monolithic materials. While bubblers are often used to deliver solid or liquid metalorganics, high sensitivity to temperature or pressure changes is often prohibitive. Liquid precursors composed of metalorganics and solvents can be accurately designed and metered to yield single or multi-cation materials. Flash vaporization permits simultaneous transport of all metalorganic species to the CVD reactor. This technology is enabling new advances in the semiconductor industry and holds great promise for the structural materials community as well. This paper describes liquid delivery MOCVD and the wide variety of materials demonstrated. Examples of fiber interface coatings produced for ceramic and metal-matrix composites illustrate the technique.