A good way to generate submicrometer patterns is the application of multilayered masking of the substrate combined with multiple reactive ion etching of this masking system. In this way the thick resist mask can be replaced by a thinner auxiliary mask. We used a C/Ti/resist multilayer masking system to etch 100 nm thick YBCO layers. The primary e-beam generated pattern was transferred into the YBCO by subsequent SFS, O_2 and Ar ion etching. Excellent selectivity was obtained by these processes. Bridges with widths down to 0.6 urn and 10 μm length showed no degradation of the superconducting properties if the YBCO structuring took place using a liquid nitrogen cooled etch stage.
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机译：产生潜置镜图案的良好方法是在该掩模系统的多反应离子蚀刻中施加基板的多层掩蔽。以这种方式，厚抗蚀剂掩模可以由更薄的辅助掩模代替。我们使用了C / TI /抗蚀剂多层掩模系统来蚀刻100nm厚的YBCO层。通过随后的SFS，O_2和Ar离子蚀刻将主要电子束产生的图案转移到YBCO中。通过这些方法获得优异的选择性。宽度降至0.6瓮和10μm长度的桥梁显示出如果使用液氮冷却的蚀刻阶段进行YBCO结构进行了超导性能的劣化。
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