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6H-SiC Photoconductive Switches Triggered at Below Bandgap Wavelengths

机译:6H-SiC光电导电开关在带隙波长下方触发

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Semi-insulating silicon carbide (SiC) is an attractive material to use to construct high voltage, compact, photoconducting semiconductor switches (PCSS) due to its large bandgap, high critical electric field strength, high electron saturation velocity, and high thermal conductivity. The critical field strength of 3 MV/cm of 6H-SiC makes it particularly attractive for compact, high voltage, fast switching applications such as a dielectric wall accelerator (DWA). To realize the benefits of the high bulk electric field strength of SiC and diffuse switch current, carriers must be excited throughout the bulk of the photo switch. Photoconducting switches with opposing electrodes were fabricated on "a" plane, vanadium compensated, semi-insulating, 6H-SiC substrates. The PCSS devices were switched by optically exciting deep extrinsic levels lying within the 6H-SiC bandgap. The SiC photoswitches were tested up to a bias voltage of 11000 V with a corresponding peak current of 150 A. The 6H-SiC substrates withstood average electric fields up to 27 MV/m. Minimum PCCS dynamic resistances of 2 and 10 Ohms were obtained with 13 mJ optical pulses at 532 and 1064 nm wavelengths, respectively
机译:半绝缘碳化硅(SiC)是一种有吸引力的材料,用于构造由于其具有大的带隙,高临界电场强度,高电子饱和速度和高导热率而构建高电压,紧凑,光导半导体开关(PCS)。临界场强度为3 mV / cm的6h-SiC使其对于紧凑,高压,快速切换应用,诸如介电壁加速器(DWA)特别有吸引力。为了实现SiC和漫射开关电流的高批量电场强度的益处,必须在整个光开关中振兴载体。具有相对电极的光导电极在“A”平面,钒补偿,半绝缘,6H-SiC基板上制造。通过光学兴奋的深层外在水平躺在6H-SiC带隙内,切换PCS装置。将SiC PhotoSwitches高达11000 V的偏置电压,相应的峰值电流为150A。6H-SiC基板,高达27 mV / m的平均电场。在532和1064nm波长下,在13 MJ光脉冲中获得2和10欧姆的最小PCC动态电阻

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