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Managing Contamination-enhanced Laser Induced Damage (CLID)

机译:管理污染增强的激光诱导损伤(CLID)

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Contamination-enhanced Laser Induced Damage (CLID) occurs when molecular or paniculate contamination, present on or in the vicinity of an optical material, leads to accelerated laser power degradation and premature failure. The physical mechanisms that cause CLID are not sufficiently understood to predict the extent to which a contaminant will cause damage. Although standard computational methods can be used to predict the amount of contamination on an optic, the effects of those molecules or particles on laser performance has not been sufficiently quantified. This paper will describe an approach for managing CLID that relies on laboratory studies to understand the relationship between contaminant type or quantity and CLID thresholds. That insight can then be used to guide the definition of cleanliness requirements and the design of material screening tests. Initial efforts to study how mass transport, the movement of contaminants in and out of the laser beam, affects damage rates will be discussed as well.
机译:污染增强的激光诱导损伤(CLID)在光学材料的分子或污染物上或在光学材料附近进行时,导致加速激光功率降解和过早失效。导致CLID的物理机制不充分理解以预测污染物会导致损坏的程度。尽管可以使用标准计算方法来预测光学污染量,但是这些分子或颗粒对激光性能的影响尚未充分定量。本文将描述管理CLID的方法,依赖于实验室研究以了解污染物类型或数量和CLID阈值之间的关系。然后可以使用该洞察力来指导清洁度要求的定义和材料筛选测试的设计。初步努力研究大规模运输,污染物在激光束中的运动,影响损坏率也将讨论。

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