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Third-order NLO properties of metal complexes containing delocalized oxygen or sulphur donor ligands and mixed oxygen and sulphur donor ligands

机译:金属配合物的三阶NLO性质含有分层氧化氧或硫供体配体和混合氧和硫供体配体的金属配合物

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The third-order nonlinear susceptibility, $chi$+(3)$/, for a series of complexes of 3,5- ditertbutyl-o-benzoquinone (dbsq), $LB@M(dbsq)$-2$/ where M $EQ Pd or Pt$RB@, o- mercaptophenol (mp), $LFBC$LB@TBA$RB$LB@Ni(mp)$-2$/$RB$RTBC@, or 1,3-dithiol- 2-thione-4,5-dithiol (dmit), $LFBC$LB@TBA$RB$LB@M(dmit)$-2$/$RB where M $EQ Ni or Pd$RTBC@, have been measured in CH$-2$/Cl$-2$/ solution by retroreflection DFWM technique at 1064 nm. The results indicate large $chi$+(3)$/ values of the order of 10$+$MIN@11$/ esu at concentration levels of 10$+18$/ molecules/cm$+3$/. These values are up to two orders higher than those found for other sulphur donor dithiolenes and nitrogen donor ligand systems, although the linear absorption is also higher.
机译:三阶非线性易感性,$ Chi $ +(3)$ /,一系列复合物3,5-二丁基-O-苯并醌(DBSQ),$ LB @ M(DBSQ)$ - 2 $ /其中m $ eq pd或pt $ rb @,o-巯基苯酚(mp),$ lfbc $ lb @ tba $ rb $ lb @ ni(mp)$ - 2 $ / $ rb $ rtbc @或1,3-dithiol-2 -thione-4,5-dithiol(dmit),$ lfbc $ lb @ tba $ rb $ lb @ m(dmit)$ - 2 $ / $ rb其中m $ eq ni或pd $ rtbc @,已在ch中衡量$ -2 $ / cl $ -2 $ /通过逆流DFWM技术在1064 nm。结果表明大量$ Chi $ +(3)美元/价值为10美元+ $ @ 11 $ / esu浓度级别10 $ + 18 $ /分子/ cm $ + 3 $ /。这些值高达两个比其他硫供体Dithiolenes和氮供体配体系统的顺序高,尽管线性吸收也更高。

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