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A DOE-ILP Assisted Conjugate-Gradient Based Power and Stability Optimization in High-K Nano-CMOS SRAM

机译:高k纳米CMOS SRAM的DOE-ILP辅助缀合物梯度基于基于的功率和稳定性优化

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In this paper, a novel design flow is presented for power minimization of nano-CMOS SRAM (static random access memory) circuits, while maintaining their performance. A 32nm high-K/metal-gate SRAM is used as an example circuit. The baseline SRAM circuit is subjected to power minimization using a dual-Vrh assignment based on a novel Design of Experiments-Integer Linear Programming (DOE-ILP) approach. However, this leads to a 15% reduction in the Static Noise Margin (SNM) of the SRAM, which is an indicator of the stability degradation of the SRAM. This reduction in the SNM is then overcome using a conjugate gradient optimization, while maintaining the minimum power consumption. The final SRAM design shows 86% reduction in power (including leakage) consumption and 8% increase in the SNM compared to the baseline design. The variability analysis of the optimized cell is carried out considering the variability effect in 12 parameters to study the robustness of the optimal SRAM circuit. An 8 x 8 array is constructed to show the feasibility of the proposed SRAM.
机译:本文提出了一种新颖的设计流程,用于纳米CMOS SRAM(静态随机存取存储器)电路的功率最小化,同时保持其性能。 32nm高k /金属栅极SRAM用作示例电路。基于基于实验 - 整数线性编程(DOE-ILP)方法的新颖设计,基线SRAM电路使用双VRH分配进行功率最小化。然而,这导致SRAM的静态噪声裕度(SNM)减少了15%,这是SRAM稳定性降解的指标。然后使用共轭梯度优化克服SNM的这种降低,同时保持最小功耗。与基线设计相比,最终SRAM设计显示出电源(包括泄漏)消耗量(包括泄漏)消耗量的86%,8%增加。考虑到12参数中的可变性效果来研究最佳SRAM电路的稳健性,执行优化单元的可变性分析。构建了8×8阵列以显示所提出的SRAM的可行性。

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