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A novel topology for pulse generators in magnetron sputter systems

机译:磁控溅射系统脉冲发生器的新型拓扑

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Pulse generators in magnetron sputter systems have to generate an electromagnetic field between the magnetrons under different operating conditions. Most of the electric parameters like output power, pulse width and the switching frequency have to be adjustable in a wide range. Another changing parameter is the load behaviour which varies from high impedance to Zener characteristic during every switching period. Starting from a comparison of current topologies this paper presents a novel pulse generator for Pulsed Plasma Surface Technologies (PPST). It is demonstrated that the combination of different basic topologies results in an improved efficiency of the sputter process.
机译:磁控溅射系统中的脉冲发生器必须在不同的操作条件下产生磁控管之间的电磁场。大多数电气参数,如输出功率,脉冲宽度和开关频率必须在宽范围内可调。另一个更改参数是在每个切换周期期间从高阻抗到齐纳特性的负载行为。从当前拓扑的比较开始,本文提出了一种用于脉冲等离子体表面技术(PPST)的新型脉冲发生器。结果证明,不同基本拓扑的组合导致溅射过程的提高。

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