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TEM investigation of grain boundaries in Yba_2Cu_3O_7 thin films grown on SrTiO_3 bicrystal substrates

机译:在SRTIO_3双基底上生长的YBA_2CU_3O_7薄膜晶界的TEM调查

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Thin films of Yba_2Cu_3O_7 were deposited on symmetrical [001]-tilt bicrystals of SrTiO_3 with misorientation angles of 10°, 15°, 24°, 36° and 45°. The grain boundaries in the substrates and the films were investigated by transmission electron microscopy. The substrate grain boundaries were found to be nearly rectilinear and symmetrical, while the film boundaries were dominantly asymmetrical and exhibited a roughness of 20 nm to 200 nm. The roughness of the grain boundaries in films deposited by the pulsed laser ablation is lower than that in sputtered films. The film grain boundaries were faceted so that the grain boundary plane corresponds to a low-index plane of one of the two adjacent grains. The majority of these low-index planes were (100) or (110) planes. The atomic order at the grain boundary was found to be perturbed within one or two interatomic spacings from the interface.
机译:YBA_2CU_3O_7的薄膜沉积在SRTIO_3的对称[001] -TILT双晶上,具有10°,15°,24°,36°和45°的错误角度。通过透射电子显微镜研究基材和膜中的晶界。发现底物晶界几乎是直线和对称的,而膜边界是显着的不对称性的,并且表现出20nm至200nm的粗糙度。由脉冲激光烧蚀沉积的薄膜中的晶界的粗糙度低于溅射膜中的薄膜。拍摄膜晶界面被刻划,使得晶粒边界平面对应于两个相邻晶粒中的一个的低折射率平面。这些低指数平面的大部分是(100)或(110)平面。发现晶界处的原子顺序在界面的一个或两个外部间距内被扰乱。

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