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Photothermal comparison of reactive low-voltage ion-plated and electron-beam-deposited TiO2 thin films

机译:反应性低压离子电镀和电子束沉积TiO2薄膜的光热比较

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TiO$-2$/ thin films of different thicknesses were prepared by conventional electron beam deposition (EBD) and reactive low-voltage ion-plating (RLVIP) techniques. These samples were designed to investigate the thickness dependent optical and thermal properties of the TiO$-2$/ coatings and the corresponding damage thresholds. In this paper we present a detailed comparison of the two groups of samples by using various photothermal techniques. The data reported include thermal conductivity, defect density, optical absorption, laser damage threshold, as well as laser conditioning effect by using Ar$+$PLU$/ laser irradiation. The general trend shown by the data is that the ion-plated samples have higher absorption, lower damage threshold, yet better thermal conductivity, lower defect density, and almost perfect stability under Ar$+$PLU$/ laser irradiation.
机译:通过传统的电子束沉积(EBD)和反应性低压离子电镀(RLVIP)技术制备不同厚度的TiO $ -2 $ /薄膜。这些样品旨在研究TiO $ -2 $ /涂层的厚度依赖性光学和热性能和相应的损伤阈值。在本文中,我们通过使用各种光热技术提出了两组样品的详细比较。报告的数据包括导热率,缺陷密度,光学吸收,激光损伤阈值,以及使用AR $ + $ PLU $ /激光照射的激光调节效果。数据显示的一般趋势是离子镀样的样品具有较高的吸收,损伤阈值,但更好的导热性,较低的缺陷密度,并且在AR $ + $ PLU $ /激光照射下几乎完美的稳定性。

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