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Design, installation and performance of the new insulator for NSTX CHI experiments

机译:NSTX CHI实验新绝缘体的设计,安装和性能

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Coaxial Helicity Injection (CHI), a non-inductive method to initiate plasma and generate toroidal plasma current, is being investigated in the National Spherical Torus Experiment (NSTX). The center stack and outer vacuum vessel are separated by insulating gaps at the top and bottom of the slim central column so that a high voltage (up to 2 kV) can be applied between them from a pulsed power supply or a capacitor bank to initiate an arc discharge. In the presence of a suitable poloidal magnetic field, the discharge is initiated at the lower gap (the injector gap) and because of the strong toroidal field develops a helical structure resulting in substantial toroidal plasma current being driven. In NSTX, up to 390 kA of toroidal current has been generated for an injected current of 25 kA. The early investigations of CHI however frequently developed arcs across the insulator at the top of the machine (the absorber gap), which terminated the desired discharge. This arcing greatly restricted the operational space available for CHI studies. During 2002, the absorber region was modified to suppress these arcs. The new design includes a new ceramic insulator on the high field side of the absorber region with a much longer tracking distance between conducting elements at the different potentials. Furthermore, two new coils were installed near the absorber to provide the ability to minimize the poloidal field connecting the center stack and outer vacuum vessel. During the subsequent experimental campaign, CHI operation was less prone to arcing in the absorber and those arcs that did occur did not terminate the main discharge.)
机译:在国家球形圆环实验(NSTX)中,正在研究同轴螺旋注射(CHI),引发等离子体的不诱导方法并产生环形等离子体电流。中心堆叠和外部真空容器通过在纤维中心柱的顶部和底部的间隙上绝缘间隙而分离,从而可以在它们之间从脉冲电源或电容器组之间施加高电压(最多2kV)以启动电弧放电。在合适的单极磁场的存在下,排出在下部间隙(喷射器间隙)处启动,并且由于强环形场显影螺旋结构,导致导致基本的环形等离子体电流被驱动。在NSTX中,为25 ka的注入电流产生了高达390 k的环形电流。然而,CHI的早期调查经常在机器顶部(吸收器间隙)顶部的绝缘体上的弧形在终止所需的放电。这个弧度极大地限制了可用于Chi研究的操作空间。在2002期间,修饰吸收区以抑制这些弧。新设计包括在吸收区的高场侧的新陶瓷绝缘体,在不同电位的导电元件之间具有更长的跟踪距离。此外,在吸收器附近安装了两个新线圈,以提供最小化连接中心堆叠和外部真空容器的单色场的能力。在随后的实验活动期间,CHI操作易于在吸收器中弧形,并且发生的弧线没有终止主要放电。)

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