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Formation of Silver Sulfide Layers and their Influence on the Electrical Characteristics of Contacts in the Field of Information Technology

机译:硫化银层的形成及其对信息技术领域触点电气特性的影响

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The use of silver as a contact material in the field of information technology is often limited because of the formation of insulating Ag_2S layers that occurs in a sulfuric atmosphere. This paper analyzes the growth of silver sulfide layers on three different silver surfaces, produced by casting, electroplating and physical vapor deposition, applying different sets of corrosion parameters. The second part contains an evaluation of these corroded Ag surfaces with regard to the characteristics which are relevant in practice, such as thickness, hardness, fritting voltage and contact resistance. No difference in contact performance were detectable with contact forces exceeding 8 cN. At lower contact and after severe corrosion conditions the casted Ag probe seems to have substantial advantages in comparison to sputtered layers, while electroplated silver shows intermediate behavior.
机译:由于在含硫气氛中发生的绝缘Ag_2S层,因此使用作为信息技术领域的接触材料的使用。 本文通过铸造,电镀和物理气相沉积产生的三种不同银表面上的硫化银层的生长,施加不同的腐蚀参数。 第二部分包含关于在实践中相关的特性的这些腐蚀AG表面的评估,例如厚度,硬度,熔点电压和接触电阻。 接触性能没有差异,接触力超过8cn。 在较低的接触后和严重的腐蚀条件下浇铸的AG探针似乎与溅射层相比具有实质的优点,而电镀银显示出中间行为。

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