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Experimental Investigation on Failure Mechanism of SiC Power MOSFETs under Single Pulse Avalanche Stress

机译:单脉冲雪崩应力下SiC功率MOSFET失效机理的试验研究

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In this paper, the typical V-T (avalanche voltage v.s. temperature) model is used to estimate the maximum junction temperature (Tj) during the single pulse unclamped inductive switching (UIS) tests. Experimental results show that the maximum Tj at failure will reach 670$sim$890K, which is less than the melting point of aluminum (933K). The typical parasitic BJT turn-on model with practical chip layout is used to analyze the possible failure mechanism. Different Tj calculation models are compared to show the accuracy of the V-T model. The UIS tests at different ambient temperatures are conducted to show the device failure is independent on the fixed critical temperature. Distribution of failure spots of decapsulated failed DUTs is observed under the optical microscope.
机译:本文使用典型的V-T(雪崩电压V.S.温度)模型用于在单脉冲未扫描的电感切换(UIS)测试期间估计最大结温(TJ)。实验结果表明,最大的t J 故障将达到670美元 SIM $ 890K,但铝的熔点(933k)。具有实用芯片布局的典型寄生BJT开启模型用于分析可能的故障机制。不同的t. J 比较计算模型以显示V-T模型的准确性。进行不同环境温度的UIS测试以显示装置故障独立于固定的临界温度。在光学显微镜下观察到解封塌的失败DUT的破坏斑点的分布。

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