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Thermal stability of 1X/X nm magnetic tunnel junctions with interfacial or shape anisotropy at high temperature

机译:高温下具有界面或形状各向异性的1x / X NM磁隧道结的热稳定性

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Shape-anisotropy magnetic tunnel junction (MTJ) is a promising candidate for spin-transfer torquemagnetoresistive random access memory (STT-MRAM) at 1X- and X-nm generations. Conventionalinterfacial-anisotropy MTJ with a CoFeB/MgO structure allows to reduce the MTJ size down to 20 nmwhile keeping high thermal stability factor Δ; however, further scaling beyond 20 nm is challenging dueto an insufficient anisotropy energy density. Recently, high Δ at such small region was shown to beachieved utilizing shape anisotropy of a cylindrical MTJ. From both fundamental and application pointsof view, it’s important to study energy barrier E for shape-anisotropy MTJ at elevated temperatures. In thisstudy, we measure temperature dependence of  of the shape- and interfacial-anisotropy MTJs below 1Xnm in order to understand the mechanism of variation in E with temperature for the two types of MTJs.
机译:形状各向异性磁隧道结(MTJ)是旋转转移扭矩的有希望的候选者磁阻随机存取存储器(STT-MRAM)在1X和X-NM世代。传统的具有CoFeB / MgO结构的界面 - 各向异性MTJ允许将MTJ尺寸降低至20 nm保持高热稳定性因子δ的同时;然而,超过20nm的进一步扩展是挑战的不充分的各向异性能量密度。最近,如此小区域的高δ显示为利用圆柱形MTJ的形状各向异性实现。从基本和应用点观点,重要的是在高温下研究形状各向异性MTJ的能量屏障E.在这方面研究,我们测量形状和界面各向异性MTJ的温度依赖性低于1XNM为了了解e的变化机制,温度为两种MTJ。

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