Comparative Local Plasma Diagnostics Performed in DCPN and HCAPN Reactors

摘要

In plasma nitriding, local plasma diagnostics are used to obtain information on the plasma distribution and parameters during the nitriding process. Since the plasma parameters have direct influence on the quality of the formed nitride layer, it is important to study the plasma in different nitriding scenarios. The goal of the paper is to present our measurements' results obtained in the Direct Current Plasma Nitriding setup (DCPN) and the Hollow Cathode Anodic Plasma Nitriding Setup (HCAPN), and to analyze the plasma parameters for different process parameters (gas mixtures, reactive gas pressure, applied voltage, etc.)