首页> 外文会议>IEEE International Conference on Nanomaterials: Applications and Properties >Influence of X-ray Irradiation on Optical Parameters of (Ga0.2 In0.8)2 Se3 Films
【24h】

Influence of X-ray Irradiation on Optical Parameters of (Ga0.2 In0.8)2 Se3 Films

机译:X射线照射对(GA0.2 IN0.8)2 SE3薄膜光学参数的影响

获取原文

摘要

$left(G a_{0.2} operatorname{In}_{0.8}ight)_{2} mathrm{Se}_{3}$ films were deposited by the thermal evaporation technique. As-deposited thin films were irradiated using wideband radiation of Cu-anode X-ray tube at different exposition times. The spectral dependences of refractive index and extinction coefficient were measured by the spectral ellipsometry technique. The optical transmission spectra of X-ray irradiated $left(G a_{0.2} operatorname{In}_{0.8}ight)_{2} mathrm{Se}_{3}$ films were studied depending on irradiation time. Parameters of Urbach absorption edge for X-ray irradiated $left(G a_{0.2} operatorname{In}_{0.8}ight)_{2} mathrm{Se}_{3}$ films were determined. The nonlinear decrease of energy pseudogap as well as nonlinear increase of Urbach energy and refractive index with increase of X-ray irradiation time are revealed. The spectral dependences of refractive indices of non-irradiated and X-ray irradiated $left(G a_{0.2} operatorname{In}_{0.8}ight)_{2} mathrm{Se}_{3}$ films are described by different dispersion relations.
机译:$ left(g a_ {0.2} operatorname {in} _ {0.8} 右)_ {2} mathrm {se} _ {3} $ ocks通过热蒸发技术沉积。在不同的曝光时间使用Cu-阳极X射线管的宽带辐射照射沉积的薄膜。通过光谱椭圆形技术测量折射率和消光系数的光谱依赖性。根据照射研究,X射线照射$ left(g a_ {0.2} operatorname {in} _ {0.8} mathrm {se} _ {3} $电影时间。 X射线照射$ left的urbach吸收边缘参数(g a_ {0.2} operatorname {in} _ {0.8} 右)_ {2} mathrm {se} _ {3} $ icill in确定。揭示了能量假阴影的非线性降低以及X射线照射时间增加的URBACH能量和折射率的非线性增加。非照射和X射线辐照的折射率的频谱依赖性$ 左(g a_ {0.2} Operatorname {in} _ {0.8} 右)_ {2} mathrm {se} _ {3} $薄膜由不同的分散关系描述。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号