Spectroscopic thin film thickness measurement system forsemiconductor industries

摘要

Accurate film thickness controls are indispensable formanufacturing defect-free semiconductor devices. Moreover, recent highintegration requires simultaneous measurement of each film thickness andoptical constants in multi-layers. This paper explains amicrospectroscopic film thickness measurement system that measures filmthickness at a very small spot (several micrometers in diameter) inseveral angstrom increments. This system also enables you to measurefilm thickness on bulk wafers and SOI wafers, and determine opticalconstants of unknown films