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Characterization of Si/SiO2interface degradation due to hot-carrier injection

机译:热载流子注入导致Si / SiO 2 界面降解的表征

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摘要

Short-channel length MOSFETs fabricated by various n-channel Si-gate technologies have been subjected to dc and pulse aging conditions. The degradation due to injection of hot-holes is found to be a self- limiting process, dictated by the dynamics of hole-trapping and their conversion to fast-states.
机译:由各种n沟道Si-gate技术制造的短沟道长度MOSFET经受了直流和脉冲老化条件。发现由于注入空穴而引起的降解是一个自我限制的过程,这是由空穴俘获的动力学及其向快速态的转化所决定的。

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