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A new approach to EBS technology

机译:EBS技术的新方法

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The use of electron bombarded silicon diodes (ESB, EBIRD, GEISHA, etc.) in vacuum tubes to generate, fast, high peak power video pulses and cw r.f. power was suggested by C. B. Norris of Stanford University. In principle, the EBS tube should be capable of providing high gain-bandwidth products and compact tube geometry. To date, only a few of the promised results have been achieved and the performance limitations have generally been: (a) degradation of the semiconductor reverse bias characteristic (b) inadequate diode cooling capability (c) some degree of incompatibility between the semiconductor diode and its mounting structure and standard tube processing procedures. We have designed, fabricated and tested single diode targets that are compatible with standard tube processing procedures. The electrical test results are consistent with the semiconductor target design. We have, to date, achieved video pulse output powers in excess of 1 kw and r.f. peak power output greater than 300W at 30 MC. We will describe the diode design, fabrication and test procedures presently being employed at Raytheon.
机译:在真空管中使用电子轰击硅二极管(ESB,EBIRD,GEISHA等)来生成快速的高峰值功率视频脉冲和cwr.f。斯坦福大学的C. B. Norris提出了权力。原则上,EBS电子管应能够提供高增益带宽的产品和紧凑的电子管几何形状。迄今为止,仅获得了一些预期的结果,并且性能限制通常是:(a)半导体反向偏置特性的下降(b)二极管冷却能力不足(c)半导体二极管与半导体之间的某种程度的不兼容其安装结构和标准管加工程序。我们已经设计,制造和测试了与标准管加工程序兼容的单个二极管靶。电气测试结果与半导体目标设计一致。迄今为止,我们已经实现了超过1 kw和r.f的视频脉冲输出功率。 30 MC时,峰值功率输出大于300W。我们将描述雷神公司目前采用的二极管设计,制造和测试程序。

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