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Transformer balun design in Gallium Arsenide and Silicon Germanium processes

机译:砷化镓和硅锗工艺中的变压器巴伦设计

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The design of two transformer baluns is presented using different process technologies. Gallium Arsenside (GaAs) has been widely used for microwave circuits over the past few decades for its high performance. Silicon Germanium (SiGe) is an emerging technology that offers performance similar to GaAs and digital circuit integration. The differences between the metal and insulator layers are presented in the context of the balun design and its requirement for tight coupling between primary and secondary coils. A comparable performance was achieved between the two processes using electromagnetic simulation. The magnitude and phase imbalances were (0.05 dB, 0.5°) for GaAs and (0.05 dB, 0.2°) for SiGe between 10 and 20 GHz.
机译:使用不同的处理技术介绍了两个变压器不平衡变压器的设计。砷化镓(GaAs)的高性能已在过去几十年中被广泛用于微波电路。硅锗(SiGe)是一项新兴技术,其性能类似于GaAs和数字电路集成。金属和绝缘层之间的差异是在平衡-不平衡变换器设计及其对初级线圈和次级线圈之间紧密耦合的要求的背景下提出的。使用电磁仿真在两个过程之间实现了可比的性能。在10至20 GHz之间,GaAs的幅度和相位不平衡度为(0.05 dB,0.5°),而SiGe的幅度和相位不平衡度为(0.05 dB,0.2°)。

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