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Comparison of thermal stress concentration and profile between power cycling test and thermal cycling test for power device heat dissipation structures using Ag sintering chip-attachment

机译:使用Ag烧结芯片的功率器件散热结构的功率循环试验和热循环试验的热应力集中和轮廓比较。

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Power semiconductor device technology needs highly efficient heat dissipation system having a chip bonding layer with high thermal conductance and reliability. This work clarifies 3D thermal stress profiles under power cycling test (PCT) and thermal cycling test (TCT) with multi-physics solver for the system having Ag sintered bonding layer as a new chip attachment technology. Both reliability test results on Von Mises stress profile are compared and the key features for each test are made clear. It was found that the maximum stress values within Si chip and Ag sintered bonding layer are at the corner of bonding layer for both PCT and TCT. The maximum stress of bonding layer under PCT ON state at chip power of 400 W is lower than the value under TCT with Ta of 25 ??C which is the Ta of PCT. Under PCT the temperature difference from stress free temperature (Tr) for bonding layer is smaller than that under TCT with Ta of 25 ??C, and this results in lower thermal stress in bonding layer. The maximum stress value of Ag sintered layer is a little lower than the conventional solder value under both PCT and TCT. This smaller stress of Ag sintered layer is thought to be due to lower Young's modulus of the Ag sintered layer.
机译:功率半导体器件技术需要高效的散热系统,该系统具有具有高导热性和可靠性的芯片接合层。这项工作阐明了具有多物理求解器的功率循环测试(PCT)和热循环测试(TCT)下的3D热应力曲线,该系统用于具有Ag烧结粘结层作为新芯片连接技术的系统。比较了Von Mises应力曲线的两个可靠性测试结果,并明确了每个测试的关键特征。发现对于PCT和TCT,Si芯片和Ag烧结的粘结层内的最大应力值都在粘结层的拐角处。当芯片功率为400 W时,在PCT ON状态下,粘结层的最大应力低于TCT时的值,Ta为25℃,这是PCT的Ta。在PCT下,粘结层与无应力温度(Tr)的温差小于TCT在Ta为25℃时的温差,这导致粘结层的热应力较低。在PCT和TCT下,Ag烧结层的最大应力值略低于常规焊料值。 Ag烧结层的这种较小的应力被认为是由于Ag烧结层的较低的杨氏模量。

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