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A CMOS SOI Stacked Shunt Switch with Sub-500ps Time Constant and 19-Vpp Breakdown

机译:具有500ps以下时间常数和19Vpp击穿电压的CMOS SOI堆叠式并联开关

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This work demonstrates a shunt stacked-FET switch with both high switching speed (~ 1ns) and high RF voltage handling capability (30 dBm). A key development in the implementation of this stacked structure is a dynamic gate bias adjustment to track the voltage swing. Measured performance for a shunt capacitor-switch network fabricated in 45-nm CMOS SOI (Leff = 40 nm) is characterized. The switch achieves a RonCoff time constant of less than 500ps, and is shown to handle a 19Vpp RF signal swing. These characteristics enable use in digital dynamic load modulation of power amplifiers at bandwidths above 10 MHz.
机译:这项工作演示了具有高开关速度(〜1ns)和高RF电压处理能力(30 dBm)的并联堆叠式FET开关。实现这种堆叠结构的关键发展是动态栅极偏置调整,以跟踪电压摆幅。表征了在45 nm CMOS SOI(Leff = 40 nm)中制造的并联电容器-开关网络的测量性能。该开关实现的RonCoff时间常数小于500ps,并显示可处理19Vpp的RF信号摆幅。这些特性使得可以在带宽超过10 MHz的功率放大器的数字动态负载调制中使用。

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