Effect of Ti Incorporation on the Micrestructure and Prop-erties of the a-C:H Films Deposited by Magnetron Sput-tering Technique

摘要

Amorphous hydrogenated carbon (a-C:H) and Tiincorporated a-C:H (Ti/a-C:H) films were deposited by magnetron sputtering with a mixture gas of CH4 and Ar. The effect of the Ti incorporation on the chemical composition, microstructure and properties of the as-deposited and the annealed films were investigated by various techniques. It has been shown that the bonding structure and the internal stress were sensitive to the incorporation of the Ti atoms. The results of the XPS revealed that the concentration of Ti atom on the surface of the film increased when the Ti/a-C:H film annealed at 300 °C. The tribologcial properties of the (Ti/)a-C:H films changed greatly after annealed, due to the graphitization, oxidation of carbon, and so forth. It compared and discussed in detail the change of the microstructure and properties of the a-C:H and Ti/aC:H films before and after annealed