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Interaction between Boron Nitride and H-terminated (111) Diamond Surface: A First Principles Investigation

机译:氮化硼与H端(111)金刚石表面之间的相互作用:第一个原理研究

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With the aim of better understanding recent experimental results on field effect transistors (FETs), weperformed density functional theory (DFT) calculations on hydrogen-terminated (111) diamond surfacewith hexagonal boron nitride (BN). In our work, atomic structures and electronic properties of thenanostructures of BN on the hydrogen-terminated (111) diamond surface will be addressed usingfirst-principles DFT based simulation code CONQUEST. The small lattice mismatch of about 0.5%between BN and the H-terminated (111) diamond surface is predicted in good agreement with previousexperiments. The binding energies of the various stacking patterns, the density of states, and the chargedensity distribution [see Fig.1] are calculated and analyzed. It turns out that weak van der Waalsinteractions dominate for BN on these H-terminated (111) diamond surface. Our results provide a betterunderstanding of the interfacial properties of BN/H-diamond and pave the way to further design field effecttransistors (FETs) having high mobility and high carrier density in nanoelectronics.
机译:为了更好地了解场效应晶体管(FET)的最新实验结果,我们 对氢封端的(111)金刚石表面进行密度泛函理论(DFT)计算 六方氮化硼(BN)。在我们的工作中,原子结构和电子性质 氢终止(111)金刚石表面上BN的纳米结构将使用 基于第一原理的DFT模拟代码CONQUEST。小晶格失配约0.5% 预测BN和H端(111)金刚石表面之间的距离与先前 实验。各种堆叠模式的结合能,状态密度和电荷 计算并分析密度分布[见图1]。事实证明,虚弱的范德华 在这些H端(111)金刚石表面上,BN相互作用占主导地位。我们的结果提供了更好的 理解BN / H金刚石的界面特性,为进一步设计场效应铺平道路 在纳米电子学中具有高迁移率和高载流子密度的晶体管(FET)。

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