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Evaluation of higher order magnetic anisotropy in a perpendicularly magnetized epitaxial ultrathin Fe layer modified by applied voltage

机译:施加电压修饰的垂直磁化外延超薄铁层中高阶磁各向异性的评估

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Recently, voltage-controlled magnetic anisotropy (VCMA) effect at an interface between a ferromagnetic metal layer and a dielectric layer attracts much attention as the key technology for voltage-torque magnetic random access memory (MRAM). For the stable operation, VCMA coefficient ξ is important factor and required to be 600-1500 fJ/Vm.) However, demonstrated ξ value (≤290 fJ/Vm) in magnetic tunnel junctions (MTJs) is much lower than the required value and its improvement is the current main issue. To make a strategy to improve ξ value, we need more systematic studies focusing on the relationship between magnetic anisotropy and VCMA effect which give clues to clarify the mechanism of VCMA effect. In this study, we investigated the thickness and applied voltage dependences of first and second order magnetic anisotropy, K1 and K2 respectively, in an ultrathin Fe film.
机译:近来,作为电压转矩磁性随机存取存储器(MRAM)的关键技术,在铁磁金属层和介电层之间的界面处的电压控制磁各向异性(VCMA)效应引起了很多关注。为了稳定运行,VCMA系数ξ是一个重要因素,要求为600-1500 fJ / Vm。)但是,磁隧道结(MTJs)的ξ值(≤290fJ / Vm)远低于所需值,并且它的改进是当前的主要问题。为了制定提高ξ值的策略,我们需要针对磁各向异性与VCMA效应之间的关系进行更系统的研究,从而为阐明VCMA效应的机理提供线索。在这项研究中,我们研究了超薄铁膜中一阶和二阶磁各向异性K1和K2的厚度和施加的电压依赖性。

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