Electrochemical Deposition of Cobalt onto the Surface of Copper Using a Choline Chloride-Based Ionic Liquid.

摘要

This study involved the deposition of black cobalt onto the surface of acopper substrate using a choline chloride-based ionic liquid. The solutionused for electro-deposition contained a 2:1 molar ratio of ethylene glycoland choline chloride, containing CoCl_2. Depositions were performed for30 minutes, with the solution kept at a constant temperature of 70°C. Theblack Co coating on the surface of the Cu substrate was confirmed usingscanning electron microscopy (SEM) and X-ray fluorescence spectroscopy(XRF). This ionic liquid-based electrochemical deposition process couldbe used as an inexpensive method for solar power generation.