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Laser damage characteristics of indium-tin-oxide film and polyimide film irradiated by 1064nm high power lasers

机译:1064nm大功率激光辐照氧化铟锡薄膜和聚酰亚胺薄膜的激光损伤特性

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摘要

The damage characteristics of the indium-tin-oxide (ITO) layer and the polyimide (PI) layer, which are two constituentcomponents of a LCD, induced by a high-peak-power laser and a high-average-power laser are investigated. The PIalignment layer is pinned on the ITO film to imitate the structure of the LCD as much as possible in our study. Under theirradiation of the high-peak-power laser, the damage process of the PI/ITO/SUB sample involves thermally inducedplastic deformation, followed by cooling when the irradiation fluence is near the LIDT, and rupture when the irradiationfluence is higher. High-average-power laser irradiation results in damaged morphologies of the bulge for thePI/ITO/SUB sample. The temperature distributions induced by the pulsed laser and the high-repetition-rate laser areinvestigated. The damage is attributed to the intrinsic heat absorption of the ITO films. Under the irritation of the highpeak-power laser, the temperature rises rapidly to a high degree at very short time because of the instant strongabsorption in ITO layer, and resulted in vaporization of ITO layer consequently. Subsequently, the vaporized ITO breaksthrough the surface PI and develops the visible damage. However, under the irritation of high-average-power laser, ITOlayer absorbs laser energy, resulting in a slow temperature rise and a small temperature gradient.
机译:氧化铟锡(ITO)层和聚酰亚胺(PI)层的损伤特性,这是两个成分 研究了由高峰功率激光器引起的LCD的组件和高均线功率激光器。 pi. 对准层在ITO膜上固定在ITO薄膜上,以便在我们的研究中尽可能地模仿LCD的结构。在下面 高峰功率激光照射,PI / ITO / Sub样品的损伤过程涉及热诱导 塑性变形,随后冷却时,当辐射注入盖子时,辐射时破裂 流量较高。高平均功率激光照射导致凸起的损坏形态 PI / ITO / sub样本。由脉冲激光和高重复速率激光引起的温度分布是 调查。损害归因于ITO膜的内在吸热。在高位刺激的刺激下 功率激光,温度在很短的时间内迅速升高到高度,因为即时强劲 在ITO层中吸收,并因此导致ITO层的蒸发。随后,蒸发的ITO突破 通过表面PI并造成可见的损坏。但是,在高均线 - 功率激光器的刺激下,ITO 层吸收激光能量,导致慢升温和较小的温度梯度。

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