Determination of alternative monitoring wavelength to increase the accuracy of measuring the layers thickness during the thin films manufacture

摘要

Currently, there are various methods to control the layers thicknesses during their manufacture and opticalmonitoring method is the basically used most often today. In this paper, we consider a method for determining themonitoring wavelength to control the optical thickness of each layer during its fabrication. By applying the method, it ispossible to reduce errors in layer thicknesses and to obtain the spectral characteristic of the transmittance (or reflection)of the experimental coating that is maximally close to the theoretical spectra. The experimental results of thin films withhigh spectral performance showed that the method can effectively reduce the errors in layers thickness.