Characterization of hafnium and zirconium silicate films fabricatedby plasma-enhanced chemical vapor deposition

摘要

Recently, hafnium, and zirconium silicates have been considered tobe attractive for new materials with high permittivity We have tried todeposit these silicate films by plasma-enhanced chemical vapordeposition (PECVD). In this report, we discuss the electrical propertiesand chemical structure of the deposited films